Semiconductor Testing
ICP-MS is one of the most important technologies in the semiconductor industry for analyzing metals and semi-metals in deionized water, various process chemicals, and wafers. ICP-MS is also used for impurity analysis in the organic semiconductors, chemical analysis, slurry analysis, vapor phase decomposition (VPD) analysis, and chemical mechanical polishing (CMP) analysis. ICP-MS provides very low detection limits (ppb to sub ppt levels) that enable ultra-trace contaminant analysis in semiconductor process chemicals and high purity materials.
Current ICP-MS systems on the market are large, benchtop instruments that require heavy lab infrastructure in addition to bulky chillers for water cooling. They also consume significant amounts of argon and power due to using an old generation of ICP torch technology. These drawbacks limit the application of ICP-MS to lab-based analysis only with long turnarounds, high cost of operation, and limited analytical capabilities.
Kimia introduces the first ever
Compact, Triple-Quad ICP-MS
– 70% smaller than single-quad ICP-MS systems!
– Only 5 – 7 L/min of argon consumption
– Patented Air-Cooled Interface
– Mobility across the facility for rapid testing
Key Features and Benefits:
– Compact design saves expensive semiconductor facility area
– 50% lower argon consumption saves at least $20,000 annually in operation costs
– Patented Air-Cooled Interface, no need for expensive water chillers
– The smallest, yet most powerful ICP torch on the market with unparalleled analytical performance (Patented)
– Detects both positive and negative ions for the first time (Patented)
– Low price tag and operating cost
Contact
info@kimiaanalytics.com
Address: 2601, 14th Avenue
Markham, ON, L3R 0H9
Hours of Operation
Monday - Friday
10:00 am - 5:00 pm
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